The MX-Max Atomic Force Microscope delivers a brand-new application experience for researchers in the nanotechnology field from industry and scientific research.
It supports scanning of wafer samples up to 300 mm in maximum size, meeting the diverse needs of semiconductors in design, analysis and quality control.
With powerful testing capabilities and simple operation, it features excellent versatility in both academic research and industrial R&D, ensuring customers efficiently complete inspection tasks.
Supports various AFM imaging modes.
The scanning range can reach up to 100 μm, and imaging at any scanning range can be achieved using a single scanner.
The open space between the tip and the sample allows for various standard experiments as well as custom-designed experimental setups to meet the needs of different research tasks.
It enables fast and precise positioning to any location on a 300 mm sample.
The high-resolution optical system allows users to easily locate the target measurement area.
User utility scripts provide semi-automated measurement and data analysis.
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Rich extended functions
It features a proper interface or mounting connection design for convenient and compatible integration with external optical paths, and can be used in conjunction with fluorescence / Raman and spectroscopic detection equipment. A laser with a wavelength of 1300 nm can be configured as the light source.
It features an extremely open architecture in both hardware and software, allowing for easy expansion of various additional components and functions in a plug‑and‑play manner. Examples include measurements in magnetic fields and liquid environments, measurements under high-temperature conditions (with precise temperature control), nanomanipulation, and near-field optical microscopy techniques. All these will help you achieve greater progress in nanotechnology research.
Clear observation interface
Equipped with a color CCD for sample alignment and a manual adjustment device for the sample stage position, with a manual adjustment range of 5×5 mm.
| AFM Modes | Contact Mode Tapping Mode Friction Force Microscopy Phase Imaging Mode Force Modulation Mode Magnetic Force Microscopy (MFM) Electrostatic Force Microscopy (EFM) Adhesion Force Imaging Scanning Capacitance Microscopy (SCM) Scanning Kelvin Probe Microscopy (SKPM) Conductive Atomic Force Microscopy (C-AFM) |
| Scanning Range | 70μm x 70μm x 5μm |
| Resolution | XY≤0.5nm，Z≤0.3nm |
| Noise Level | ≤50pm |
| Nonlinearity | ≤0.1% |
| Sample Stage | Diameter: 200mm Thickness: 10mm Mass: 1kg |
| Sample Movement Range | XY≥200mm |
| Optical System | 5X, 5-megapixel CCD Video microscope assisted observation system The optical resolution of the video microscope under conventional conditions is ≤ 2 μm |
| Controller | 6 ADC analog-to-digital converters (2 high-speed) 3 DAC digital-to-analog converters (up to 6) 2 independent digital lock-in amplifiers 4-channel simultaneous imaging 6 BNC input/output signal software-configurable interfaces |
